瀏覽次數:556by:元佳宇
CHF3
Halocarbon 14 / Trifluoromethane Application Halocarbon 14 is combined with oxygen to etch
Halocarbon 14 / Trifluoromethane
Application
Halocarbon 14 is combined with oxygen to etch polysilicon, silicon dioxide, silicon nitride, some metals and metal silicides. It can be combined with Halocarbon 116 (C2F6) or used alone to clean wafers and chambers.
Product Specification
Purity 99.999%
N2 5
O2 1
CO2 0.5
CO 0.5
H2O 1
SF6 1
OHC 1
HF 0.1
*Unit: ppm
https://chienkung.web66.com.tw/web/NMD?postId=162580富士電機MINI系列變頻器
~~~~~~日本富士電機MINI系列變頻器價格絕對優惠!!!歡迎各公司行號詢價!!!詢價MAIL:c